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1

All Wet Stripping of Implanted Photoresist

Christenson, Kurt K., Butterbaugh, Jeffery W., Wagener, Thomas J., Lee, Nam Pyo, Schwab, Brent, Fussy, Michael, Diedrick, John

Journal:

Solid State Phenomena

Year:

2008

Language:

english

File:

PDF, 153 KB

english, 2008

2

Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor

Sih, Vincent, Reimer, Berthold, Ratkovich, Anthony S., Lauerhaas, Jeffrey M., Butterbaugh, Jeffery W.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.92 MB

english, 2014

3

Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist

DeKraker, David, Pasker, Blake, Butterbaugh, Jeffery W., Christenson, Kurt K., Wagener, Thomas J.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 258 KB

english, 2009

4

[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Cryogenic Nano-Aerosol: Particle Removal and Damage-Free Cleaning for IC Manufacturing

Lauerhaas, Jeffrey M., Thomes, Gregory P., Schwab, Brent D., Rathman, Christina Ann, Rotondaro, Antonio L. P., Bassett, Derek W., Butterbaugh, Jeffery W., Mbanaso, Chimaobi

Year:

2019

Language:

english

File:

PDF, 1.44 MB

english, 2019

5

Handbook of Silicon Wafer Cleaning Technology || Gas-phase Wafer Cleaning Technology

Butterbaugh, Jeffery W.

Year:

2008

Language:

english

File:

PDF, 1.21 MB

english, 2008

6

Uniform Ultrathin Oxide Growth for High-k Preclean

Butterbaugh, Jeffery W., Nelson, Steven L., Wagener, Thomas J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 294 KB

english, 2005

7

Controlling Silicon Surface Roughness During Photochemical Cleaning

Butterbaugh, Jeffery W., Schwab, Brent, Sorsch, Thomas, Green, Martin L.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 261 KB

2001

8

Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching

Hanestad, Ron, Schwab, Brent, Butterbaugh, Jeffery W., Lee, Kun Tack, Shim, Woo Gwan, Kim, Sang Yong, Han, Yong Pil

Journal:

Solid State Phenomena

Year:

2003

File:

PDF, 321 KB

2003

9

SPIE Proceedings [SPIE Micromachining and Microfabrication - San Francisco, CA (Monday 22 October 2001)] Micromachining and Microfabrication Process Technology VII - Stiction-free release etch with anhydrous HF/water vapor processes

Hanestad, Ron, Butterbaugh, Jeffery W., ben-Hamida, Abdselem, Gelmi, Ilaria, Karam, Jean Michel, Yasaitis, John A.

Year:

2001

Language:

english

File:

PDF, 752 KB

english, 2001

10

Novel Wet Etching of Silicon Nitride in a Single Wafer Spin Processor

Yu, Bill, Huang, Stanley, Yeh, Matt, Chen, C.C., Jang, S.M., Ratkovich, Anthony, Yang, David, Lauerhaas, Jeffrey M., Butterbaugh, Jeffery W.

Journal:

Solid State Phenomena

Year:

2012

Language:

english

File:

PDF, 421 KB

english, 2012

11

ECS Transactions [ECS 220th ECS Meeting - Boston, MA (October 9 - October 14, 2011)] - Effects of Varying Surface Film Thickness on Particle Adhesion in Semiconductor Material-Based Systems

Smith, Katie M., Butterbaugh, Jeffery, Beaudoin, Stephen

Year:

2011

Language:

english

File:

PDF, 638 KB

english, 2011

12

Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam

Guo, Ted, Yu, Wesley, Chien, C.C., Lin, Euing, Yang, N.H., Lin, J.F., Wu, J.Y., Ratkovich, Anthony, Kahaian, Don, Butterbaugh, Jeffery W., Lauerhaas, Jeffrey M.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 508 KB

english, 2014

13

Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance

Mbanaso, Chimaobi, Butterbaugh, Jeffery W., Becker, David Scott, Printz, Wallace P., Rotondaro, Antonio L.P., Bassett, Derek W., Thomes, Gregory P., Schwab, Brent D., Rathman, Christina Ann, Lauerhaas

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 6.56 MB

english, 2016

14

[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Cryogenic Nano-Aerosol: Particle Removal and Damage-Free Cleaning for IC Manufacturing

Lauerhaas, Jeffrey M., Thomes, Gregory P., Schwab, Brent D., Rathman, Christina Ann, Rotondaro, Antonio L. P., Bassett, Derek W., Butterbaugh, Jeffery W., Mbanaso, Chimaobi

Year:

2019

File:

PDF, 1.44 MB

2019